4 Revision History
Changes from Revision E (April 2018) to Revision F (February 2022)
- 将超薄型封装要点中的厚度从 0.35mm 更改为 0.36mmGo
- 将超薄型封装图片中的厚度从 0.35mm 更新为 0.36mmGo
- Changed ultra-low profile image height from 0.35 mm to 0.36
mm.Go
- Added FemtoFET Surface Mount Guide note.Go
Changes from Revision D (Decermber 2016) to Revision E (April 2018)
- Raised IDSS Test Condition VoltageGo
- Raised IGSS Test Condition VoltageGo